Batch-type Alkaline Polishing Equipment
Batch-type Alkaline Polishing Equipment
Equipment Name:
Batch-type Alkaline Polishing Equipment
Equipment Model:
SC-CSZJ9600E-15F
Equipment Application:
This equipment is used for polishing, etching and cleaning treatment of diffused wafers and also compatible for texturing and cleaning treatment of bifacial solar cells.
Process Flow:
Pre-cleaning→Polishing→Post-cleaning/ O3 cleaning→Acid cleaning→Hot water drying→Drying (for reference only)
Features:
1. Throughput: 400pcs/batch,9600pcs/h(210 wafer),480pcs/batch,12000pcs/h(182 wafer).
2. Compatible with rear side etch polishing and mono-crystalline rear side texturing process.
3. Suitable for various additives.
4. Wafer thickness handling capability up to 120μm.
5. With dry clean area and self-cleaning system.
6. Quick inline bath change.
7. Suitable with MES, RFID system, inline weight testing optional.
Parameters:
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