Equipment Name:

Inline TCO Coating Equipment (Reactive Plasma Deposition, RPD/PAR),and Magnetron Sputter,PVD

Equipment Model:

PAR5500A

Equipment Application:

In-line physical coating equipment for Transparent Conductive Oxide (TCO) coating on wafer,glass plate or flexible substrate.

Coating Principle:

1、Magnetron Sputter (PVD).

2、Reactive Plasma Deposition (RPD).

Features:

1、Multiple cathode operation for seed layer and multiple refractive index tandem TCO.

2、No bombardment on the substrate while keeping high mobility.

Parameters: